Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power 13.56 MHz, 400 800 W, pressure 10 30 mTorr. Plasma parameters such as electron density (ne), temperature (Te), potential (Vp), floating (Vf) using several instruments (VI probe mass/energy analyzer, etc.) subsequently analyzed. Regression analysis was performed correlate data parameters. As result, (ne) (Te) observed be in good agreement non-invasive measurement results. particular, VI probes highly correlated almost all Therefore, results study provide basis for estimation techniques.